Parent Group | High Purity Metals |
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99.9% Iridium Metal Powder
CAS # | 7439-88-5 |
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Product # | 0918-0013-16-30 |
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Parent Group | High Purity Metals |
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Molecular Weight | 192.2 |
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MDL # | MFCD00149749 |
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EINECS # | 232-180-3 |
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Formula | Ir |
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Sizes | 100g |
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PubChem URL: | https://pubchem.ncbi.nlm.nih.gov/compound/23924 |
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Chemical Properties
Form | powder |
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Purity | 99.90% |
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Morphology | Variable |
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Boiling Point | 4 | 428 ?C |
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Melting Point | 2 | 446 ?C |
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Applications
It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance. |
Notes
Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. |
Bulk Density | 192.22 g/mL |
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True Density | 22.65 g/cm3 |
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Particle Size | NA |
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Storage & Sensitivity | Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges. |
---|
Chemical Properties
Form | powder |
---|
Purity | 99.90% |
---|
Morphology | Variable |
---|
Boiling Point | 4 | 428 ?C |
---|
Melting Point | 2 | 446 ?C |
---|
Applications
It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance. |
Notes
Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. |
Bulk Density | 192.22 g/mL |
---|
True Density | 22.65 g/cm3 |
---|
Particle Size | NA |
---|
Storage & Sensitivity | Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges. |
---|
Chemical Properties
Form | powder |
---|
Purity | 99.90% |
---|
Morphology | Variable |
---|
Boiling Point | 4 | 428 ?C |
---|
Melting Point | 2 | 446 ?C |
---|
Bulk Density | 192.22 g/mL |
---|
True Density | 22.65 g/cm3 |
---|
Particle Size | NA |
---|
Storage & Sensitivity | Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges. |
---|
Applications
It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance. |
Notes
Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. |