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99.9% Silicon Metal Rod

CAS # 7440-21-3
Product # 1909-0013-18-30
Parent Group High purity Metals
Molecular Weight 28.085
MDL # MFCD00085311
EINECS # 2311308
Formula Si
Sizes 1-Pc

99.9% Silicon Metal Rod

CAS # 7440-21-3
Product # 1909-0013-18-30
Parent Group High purity Metals
Molecular Weight 28.085
MDL # MFCD00085311
EINECS # 2311308
Formula Si
Sizes 1-Pc

Chemical Properties

Form Rod
Purity 99.90%
Morphology Variable
Boiling Point 2900 °C
Melting Point 1414 °C

Applications

99.9% silicon metal rod" is crucial in electronics and metallurgy. It's used to create semiconductor components, integrated circuits, and improve material properties through alloying. Its high purity and controlled characteristics make it valuable in various applications.

Notes

Producing high purity uniform shaped Silicon Rods with the highest possible density 99.9+% Ultra High Purity Metallic Rodsand smallest possible average grain sizes for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD)
Bulk Density 2330 kg/m3
True Density N/A
Particle Size Available in multiple sizes
Storage & Sensitivity Precautions for Safe Handling: Avoid creating dust. Provide adequate ventilation if dusts are created. Avoid breathing dust or fumes. Avoid contact with skin and eyes. Wash thoroughly before eating or smoking. See section 8 for information on personal protection equipment.Conditions for Safe Storage: Store in a sealed container. Store in a cool, dry area. Store away from halogens. See section 10 for more information on incompatible materials.

This product is currently out of stock and unavailable.

Chemical Properties

Form Rod
Purity 99.90%
Morphology Variable
Boiling Point 2900 °C
Melting Point 1414 °C

Applications

99.9% silicon metal rod" is crucial in electronics and metallurgy. It's used to create semiconductor components, integrated circuits, and improve material properties through alloying. Its high purity and controlled characteristics make it valuable in various applications.

Notes

Producing high purity uniform shaped Silicon Rods with the highest possible density 99.9+% Ultra High Purity Metallic Rodsand smallest possible average grain sizes for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD)
Bulk Density 2330 kg/m3
True Density N/A
Particle Size Available in multiple sizes
Storage & Sensitivity Precautions for Safe Handling: Avoid creating dust. Provide adequate ventilation if dusts are created. Avoid breathing dust or fumes. Avoid contact with skin and eyes. Wash thoroughly before eating or smoking. See section 8 for information on personal protection equipment.Conditions for Safe Storage: Store in a sealed container. Store in a cool, dry area. Store away from halogens. See section 10 for more information on incompatible materials.

This product is currently out of stock and unavailable.

This product is currently out of stock and unavailable.

Chemical Properties

Form Rod
Purity 99.90%
Morphology Variable
Boiling Point 2900 °C
Melting Point 1414 °C
Bulk Density 2330 kg/m3
True Density N/A
Particle Size Available in multiple sizes
Storage & Sensitivity Precautions for Safe Handling: Avoid creating dust. Provide adequate ventilation if dusts are created. Avoid breathing dust or fumes. Avoid contact with skin and eyes. Wash thoroughly before eating or smoking. See section 8 for information on personal protection equipment.Conditions for Safe Storage: Store in a sealed container. Store in a cool, dry area. Store away from halogens. See section 10 for more information on incompatible materials.

Applications

99.9% silicon metal rod" is crucial in electronics and metallurgy. It's used to create semiconductor components, integrated circuits, and improve material properties through alloying. Its high purity and controlled characteristics make it valuable in various applications.

Notes

Producing high purity uniform shaped Silicon Rods with the highest possible density 99.9+% Ultra High Purity Metallic Rodsand smallest possible average grain sizes for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD)

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