| Parent Group | High Purity Metals |
|---|
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99.9% Scandium Metal Target
| CAS # | 7440-20-2 |
|---|
| Product # | 1903-0013-20-30 |
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| Parent Group | High Purity Metals |
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| Molecular Weight | 44.96 |
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| MDL # | MFCD00016323 |
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| EINECS # | 2341592 |
|---|
| Formula | Sc |
|---|
| Sizes | 1-pc |
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| PubChem URL: | https://pubchem.ncbi.nlm.nih.gov/compound/Scandium |
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99.9% Scandium Metal Target
| CAS # | 7440-20-2 |
|---|
| Product # | 1903-0013-20-30 |
|---|
| Parent Group | High Purity Metals |
|---|
| Molecular Weight | 44.96 |
|---|
| MDL # | MFCD00016323 |
|---|
| EINECS # | 2341592 |
|---|
| Formula | Sc |
|---|
| Sizes | 1-pc |
|---|
Chemical Properties
| Form | Target |
|---|
| Purity | 99.90% |
|---|
| Morphology | Variable |
|---|
| Boiling Point | 2830 °C |
|---|
| Melting Point | 1541 °C |
|---|
Applications
| 99.9% pure scandium metal targets are used in thin film deposition techniques like sputtering and evaporation. They find applications in electronics, optics, and research for creating functional coatings and advanced materials. Proper handling and target purity are critical for successful film production. |
Notes
| 99.9% pure scandium metal targets are crucial for thin film deposition using PVD methods like sputtering and evaporation. Used in electronics, optics, and research. Purity and careful handling ensure effective film production. |
| Bulk Density | 3.0 g/cm³ |
|---|
| True Density | N/A |
|---|
| Particle Size | Available in multiple sizes |
|---|
| Storage & Sensitivity | Store 99.9% pure scandium metal targets in a controlled, dry environment to prevent reactivity with air and moisture. Seal the targets in airtight containers to maintain their quality and safety. Proper storage ensures effective use in thin film deposition applications while minimizing degradation and potential reactions. |
|---|
Chemical Properties
| Form | Target |
|---|
| Purity | 99.90% |
|---|
| Morphology | Variable |
|---|
| Boiling Point | 2830 °C |
|---|
| Melting Point | 1541 °C |
|---|
Applications
| 99.9% pure scandium metal targets are used in thin film deposition techniques like sputtering and evaporation. They find applications in electronics, optics, and research for creating functional coatings and advanced materials. Proper handling and target purity are critical for successful film production. |
Notes
| 99.9% pure scandium metal targets are crucial for thin film deposition using PVD methods like sputtering and evaporation. Used in electronics, optics, and research. Purity and careful handling ensure effective film production. |
| Bulk Density | 3.0 g/cm³ |
|---|
| True Density | N/A |
|---|
| Particle Size | Available in multiple sizes |
|---|
| Storage & Sensitivity | Store 99.9% pure scandium metal targets in a controlled, dry environment to prevent reactivity with air and moisture. Seal the targets in airtight containers to maintain their quality and safety. Proper storage ensures effective use in thin film deposition applications while minimizing degradation and potential reactions. |
|---|
Chemical Properties
| Form | Target |
|---|
| Purity | 99.90% |
|---|
| Morphology | Variable |
|---|
| Boiling Point | 2830 °C |
|---|
| Melting Point | 1541 °C |
|---|
| Bulk Density | 3.0 g/cm³ |
|---|
| True Density | N/A |
|---|
| Particle Size | Available in multiple sizes |
|---|
| Storage & Sensitivity | Store 99.9% pure scandium metal targets in a controlled, dry environment to prevent reactivity with air and moisture. Seal the targets in airtight containers to maintain their quality and safety. Proper storage ensures effective use in thin film deposition applications while minimizing degradation and potential reactions. |
|---|
Applications
| 99.9% pure scandium metal targets are used in thin film deposition techniques like sputtering and evaporation. They find applications in electronics, optics, and research for creating functional coatings and advanced materials. Proper handling and target purity are critical for successful film production. |
Notes
| 99.9% pure scandium metal targets are crucial for thin film deposition using PVD methods like sputtering and evaporation. Used in electronics, optics, and research. Purity and careful handling ensure effective film production. |