99.9% Iridium Metal Powder - Viridis Materials Skip to content

99.9% Iridium Metal Powder

CAS # 7439-88-5
Product # 0918-0013-16-30
Parent Group High Purity Metals
Molecular Weight 192.2
MDL # MFCD00149749
EINECS # 232-180-3
Formula Ir
Sizes 100g

99.9% Iridium Metal Powder

CAS # 7439-88-5
Product # 0918-0013-16-30
Parent Group High Purity Metals
Molecular Weight 192.2
MDL # MFCD00149749
EINECS # 232-180-3
Formula Ir
Sizes 100g

Chemical Properties

Form powder
Purity 99.90%
Morphology Variable
Boiling Point 4 | 428 ?C
Melting Point 2 | 446 ?C

Applications

It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance.

Notes

Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications.
Bulk Density 192.22 g/mL
True Density 22.65 g/cm3
Particle Size NA
Storage & Sensitivity Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges.

This product is currently out of stock and unavailable.

Chemical Properties

Form powder
Purity 99.90%
Morphology Variable
Boiling Point 4 | 428 ?C
Melting Point 2 | 446 ?C

Applications

It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance.

Notes

Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications.
Bulk Density 192.22 g/mL
True Density 22.65 g/cm3
Particle Size NA
Storage & Sensitivity Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges.

This product is currently out of stock and unavailable.

This product is currently out of stock and unavailable.

Chemical Properties

Form powder
Purity 99.90%
Morphology Variable
Boiling Point 4 | 428 ?C
Melting Point 2 | 446 ?C
Bulk Density 192.22 g/mL
True Density 22.65 g/cm3
Particle Size NA
Storage & Sensitivity Keep container tightly sealed. Store in cool | dry place in tightly closed containers. Ensure good ventilation at the work place. Protects against electrostatic charges.

Applications

It is extremely corrosion resistant and is used as an alloying agent with metals such as gold and osmium to produce alloys which are extremely hard and have good corrosion resistance.

Notes

Iridium Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation | Low Temperature Organic Evaporation | Atomic Layer Deposition (ALD) | Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications.

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